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MINIMALLY INVASIVE INTERSPINOUS PROCESS SPACER IMPLANTS AND METHODS
专利权人:
发明人:
THOMMEN DANIEL,WEBER MARKUS,TEISEN JACQUES,KRAFT MARKUS,KAUFMANN FLORIAN,HUNZIKER MARKUS,ASCHMANN FELIX,SALADIN STEFAN,OSWALD MARTIN,RANDEGGER ROMAN
申请号:
IN4852/CHENP/2012
公开号:
IN2012CN04852A
申请日:
2012.06.04
申请国别(地区):
IN
年份:
2014
代理人:
摘要:
An interspinous process spacer for implantation in an interspinous space between a superior spinous process and an inferior spinous process includes a balloon-like body, a first deployable protrusion and second deployable protrusion. The body has a distal end, a proximal end and a longitudinal axis extending between the proximal and distal ends. The spacer is arrangeable in an unexpanded configuration and expanded configuration. The first depoloyable protrusion is mounted proximate the proximal end and the second deployable protrusion is mounted proximate the distal end. The first and second deployable protrusions are oriented generally parallel o the longitudinal axis in the unexpanded configuration and generally perpendicular to the longitudinal axis in the expanded configuration.
来源网站:
中国工程科技知识中心
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