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MINIMALLY INVASIVE INTERSPINOUS PROCESS SPACER IMPLANTS AND METHODS
专利权人:
DePuy Synthes Products; Inc.
发明人:
Daniel Thommen,Markus Weber,Jacques Teisen,Markus Kraft,Florian Kaufmann,Markus Hunziker,Felix Aschmann,Stefan Saladin,Martin Oswald,Roman Randegger
申请号:
US15935734
公开号:
US20180344363A1
申请日:
2018.03.26
申请国别(地区):
US
年份:
2018
代理人:
摘要:
An interspinous process spacer for implantation in an interspinous space between a superior spinous process and an inferior spinous process includes a balloon-like body, a first deployable protrusion and a second deployable protrusion. The body has a distal end, a proximal end and a longitudinal axis extending between the proximal and distal ends. The spacer is arrangeable in an unexpanded configuration and an expanded configuration. The first deployable protrusion is mounted proximate the proximal end and the second deployable protrusion is mounted proximate the distal end. The first and second deployable protrusions are oriented generally parallel to the longitudinal axis in the unexpanded configuration and generally perpendicular to the longitudinal axis in the expanded configuration.
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