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温水で落ちる肌用下地化粧料
专利权人:
株式会社;資生堂
发明人:
岸菜 孝広,金子 勝之,大橋 しほ花,龍田 周,佐藤 由紀子,首藤 美奈子,山口 雅彦,臼杵 裕代,松森 美貴野,竹下 望
申请号:
JP2013103657
公开号:
JP6144109B2
申请日:
2013.05.16
申请国别(地区):
JP
年份:
2017
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a skin base cosmetic to be applied to the skin before applying a foundation and the like, the skin base cosmetic not coming off with sweat or cold water and being easily removable from the skin together with a make-up without using a washing agent such as cleansing and facial cleanser when rubbed with warm water.SOLUTION: A skin base cosmetic to be applied to the skin before applying a skin make-up cosmetic has an aqueous phase comprising water as a continuous phase and contains (a) a hydrophobic polymer, (b) a polyhydric alcohol and (c) a hydrophilic nonionic surfactant, where the (a) hydrophobic polymer is 0.5 to 7 mass% in the cosmetic and dispersed as a particle in the aqueous phase, the (b) polyhydric alcohol is 0.5 to 5.5 pts.mass relative to 1 pt.mass of the (a) hydrophobic polymer, and the (c) hydrophilic nonionic surfactant is 1 to 5 mass% in the cosmetic. The skin base cosmetic can be all removed with warm water at 35 to 45°C when the skin make-up cosmetic is removed.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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