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以溫水卸妝的皮膚用打底化妝料
专利权人:
SHISEIDO COMPANY; LTD.
发明人:
KISHINA, TAKAHIRO,岸菜孝广,岸菜孝廣,KANEKO, KATSUYUKI,金子胜之,金子勝之,TATSUTA, AMANE,龙田周,龍田周,SATO, YUKIKO,佐藤由纪子,佐藤由紀子,SHUDO, MINAKO,首藤美奈子,YAMAGUCHI, MASAHIKO,山口雅彦,山口雅彥,USUKI, HIROYO,臼杵裕代,NOSAKA, MIKINO,野
申请号:
TW102136711
公开号:
TWI602578B
申请日:
2013.10.11
申请国别(地区):
TW
年份:
2017
代理人:
摘要:
The object of this invention is to provide a skin underlayer cosmetic applied to skin before any foundation or the like is applied, without wrinkling or falling off because of cold water or sweat, and when being rubbed with warm water, it can be removed easily from skin together with make-up without using any cleanser such as makeup remover or facial cleaner.The skin underlayer cosmetic of the present invention is a skin underlayer cosmetic applied to skin before any skin make-up cosmetic is applied, which uses an aqueous phase containing water as the continuous phase, and contains (a) a vinyl acetate polymer, (b) a polyhydric alcohol and (c) a hydrophilic non-ionic surfactant, wherein (a) the vinyl acetate polymer is 0.5 to 7% by mass in the cosmetic and is dispersed as particles in the aqueous phase, and with respect to 1 part by mass of (a) the vinyl acetate polymer, (b) the polyhydric alcohol is 0.5 to 5.5 parts by mass, and (c) the hydrophilic non-ionic surfactant is 1 to 5% by mass in the cosmetic. The skin underlayer cosmetic can be removed from skin together with the skin make-up cosmetic with the warm water at 38 to 45℃.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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