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ELECTRON BEAM IRRADIATION DEVICE FOR APERTURE VESSEL
专利权人:
JAPAN AE POWER SYSTEMS CORPORATION
发明人:
EGUCHI, SHIRO,HIKOSAKA, TOMOYUKI,GOHZAKI, SATORU,SUZUKI, TAKAYUKI,SATO, SHIGEKATSU,HASHIMOTO, ISAO
申请号:
EP08752918
公开号:
EP2292515A4
申请日:
2008.05.12
申请国别(地区):
EP
年份:
2012
代理人:
摘要:
The apparatus has a rotating body 11 in an irradiation processing chamber 10. Outside the rotating body 11, plural retaining mechanisms 2 are installed at regular interval to retain open-mouthed containers. Above the conveying path, an electron beam generating means 40 is arranged. The rotating body 11 has a rotary shaft 12 that penetrates into the electron beam generating means 40. On the rotary shaft 12, a grid plate 45 of an electron beam source 41 of the electron beam generating means 40 is rotatively installed. On the grid plate 45, plural emission holes 46 are provided at the same interval as that of the retaining mechanisms 2 on the rotating body 11. In an predetermined irradiation area, the emission holes 46 and a irradiation windows 43 on the irradiation processing chamber 10 and the retaining mechanism 2 for holding the container are aligned approximately on the same axes.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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