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Electron beam sterilization method
专利权人:
JFEエンジニアリング株式会社
发明人:
野田 秀作
申请号:
JP2019021998
公开号:
JP2020127642A
申请日:
2019.02.08
申请国别(地区):
JP
年份:
2020
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide an electron beam sterilization method for equalizing an absorbed dose in an irradiated object in an electron beam sterilization method for sterilizing or sterilizing an irradiated object by irradiating the irradiated object with an electron beam. SOLUTION: This is an electron beam sterilization method in which an object to be irradiated is irradiated with an electron beam to sterilize or sterilize the object to be irradiated, and the object to be irradiated is irradiated with the electron beam from at least two directions to shield the electron beam. An irradiation dose adjusting plate 20 having a region SA in which the shielding material is arranged and an region SB in which the shielding material is not arranged is arranged between the electron beam extraction window of the electron beam irradiator and the irradiated object, and the irradiation dose is described. An electron beam sterilization method, which comprises irradiating an object to be irradiated with an electron beam via an adjusting plate 20. [Selection diagram] Fig. 3【課題】電子線を被照射物に照射して殺菌又は滅菌を行う電子線殺菌方法において、被照射物内の吸収線量を均一化する電子線殺菌方法を提供すること。【解決手段】電子線を被照射物に照射して殺菌又は滅菌を行う電子線殺菌方法であって、電子線を被照射物に対して少なくとも二方向から照射するようにし、電子線を遮蔽する遮蔽材を配置した領域SAと、前記遮蔽材を配置しない領域SBとを有する照射線量調整板20を電子線照射装置の電子線取出窓と前記被照射物との間に配置し、前記照射線量調整板20を介して電子線を被照射物に照射することを特徴とする、電子線殺菌方法。【選択図】図3
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