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Acrylate polymers based on t-butyl acrylate and / or t-butyl methacrylate
专利权人:
ビーエーエスエフ ソシエタス・ヨーロピア
发明人:
ダウシュ,ウィルマ,エム.,ツァイツ,カトリン,シュナイダー,タンヤ,アンゲル,マキシミリアン,デ ポッツォーリ,ベルンド,ウッド,クラウディア,ダウシュ,ウィルマ,エム.,ツァイツ,カトリン,シュナイダー,タンヤ,アンゲル,マキシミリアン,デ ポッツォーリ,ベルンド,ウッド,クラウディア
申请号:
JP2007314447
公开号:
JP4855377B2
申请日:
2007.12.05
申请国别(地区):
JP
年份:
2012
代理人:
摘要:
The invention relates to acrylate polymers comprising a K-value ranging from 10 to 60, which can be obtained by the radical polymerization of: 30 to 99 wt. % of tert-butyl acrylate and/or tert-butyl methacrylate designated as monomer A; 1 to 28 wt. % of acrylic acid and/or methacrylic acid designated as monomer B, and; 0 to 60 wt. % of a radically copolymerizable monomer or of a radically copolymerizable monomer mixture designated as monomer C, whereby at least one of monomers C yields a homopolymer with a glass-transition temperature lower than 30° C., with the provision that the wt. %'s total 100. The radical polymerization is carried out in the presence of alkane thiols with a C chain length of C 14 to C 22. The invention also relates to acrylate polymers comprising a K-value ranging from 10 to 60, which can be obtained by the radical polymerization of: 30 to 99 wt. % of tert-butyl acrylate and/or tert-butyl methacrylate designated as monomer A; 1 to 28 wt. % of acrylic acid and/or methacrylic acid designated as monomer B, and; 0 to 60 wt. % of a radically copolymerizable monomer or of a radically copolymerizable monomer mixture designated as monomer C, whereby at least one of monomers C yields a homopolymer with a glass-transition temperature lower than 30° C., with the provision that the wt. %'s total 100. The radical polymerization is carried out in the presence of alkane thiols with a C chain length of C 10 to C 22 followed by a hydrogen peroxide treatment. The invention also relates to the use of these acrylate polymers as film formers as well as to their use in cosmetic preparations.
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中国工程科技知识中心
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