AN, HEE SEON,안희선,SHIN, JIN SEOB,신진섭,AN, SU SUN,안수선,CHO, SEONG A,조성아,CHO, JUN CHEOL,조준철,HAN, SANG HUN,한상훈
申请号：
KR1020100071148
公开号：
KR1020120009945A
申请日:
2010.07.23
申请国别(地区):
KR
年份:
2012
代理人:
摘要：
PURPOSE: A cosmetic composition of retinoid low irritation is provided to protect skin from retinoid irritation and inflammation.CONSTITUTION: A cosmetic composition contains retinoid and a material which reversibly suppresses retinal dihydronase. The material is citral and is contained in 0.01-0.5 wt% based on total weight. The citral includes cis and trans. The composition is used for anti-aging, anti-wrinkling, and retinoid relief. The cosmetic composition is manufactured in the form of a skin softener, massage cream, nutrition cream, pack, gel, lotion, ointment, or spray.COPYRIGHT KIPO 2012본 발명은 레티놀의 산화에 의해 형성된 레티날(retinal)을 레티노이드산(retinoid acid)으로 전환시키는 알데하이드 디하이드로제나제(aldehyde dehydrogenase)를 가역적으로 저해하는 물질을 레티놀과 함께 사용하여 레티노이드산의 생성속도를 줄임으로써 레티노이드의 사용에 따른 자극을 완화시킨 레티노이드 저자극 화장료 조성물에 관한 것이다.
