HIGH CLEANING SILICA WITH LOW ABRASION AND METHOD FOR MAKING SAME
- 专利权人:
- J.M. HUBER CORPORATION
- 发明人:
- SINCLAIR, FITZGERALD, A.
- 申请号:
- SG11201507099R
- 公开号:
- SG11201507099RA
- 申请日:
- 2014.03.14
- 申请国别(地区):
- SG
- 年份:
- 2015
- 代理人:
- 摘要:
- Silica materials having high cleaning and low abrasion properties are described, together with methods of making such materials and dentifrice compositions comprising the silica materials.
- 来源网站:
- 中国工程科技知识中心
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相关专利
- High Cleaning Silica with Low Abrasion and Method for Making Same
- High Cleaning Silica With Low Abrasion And Method Of Making Same
- High cleaning silica with low abrasion and method for making same
- HIGH CLEANING SILICA WITH LOW ABRASION AND METHOD FOR MAKING SAME
- HIGH CLEANING SILICA WITH LOW ABRASION AND METHOD FOR MAKING SAME