HIGH CLEANING SILICA WITH LOW ABRASION AND METHOD FOR MAKING SAME

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专利权人:

J.M. HUBER CORPORATION

发明人:

SINCLAIR, FITZGERALD, A.

申请号：

SG11201507099R

公开号：

SG11201507099RA

申请日:

2014.03.14

申请国别(地区):

SG

年份:

2015

代理人:

摘要：

Silica materials having high cleaning and low abrasion properties are described, together with methods of making such materials and dentifrice compositions comprising the silica materials.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/