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Ultra-thin metal oxide and carbon-metal oxide films prepared by atomic layer deposition (ALD)
专利权人:
Xinhua Liang;Alan W. Weimer;Miao Yu;Jianhua Li;John L. Falconer
发明人:
Alan W. Weimer,Xinhua Liang,Jianhua Li,John L. Falconer,Miao Yu
申请号:
US13319122
公开号:
US20120201860A1
申请日:
2010.05.11
申请国别(地区):
US
年份:
2012
代理人:
摘要:
Ultra-thin porous films are deposited on a substrate in a process that includes laying down an organic polymer, inorganic material or inorganic-organic material via an atomic layer deposition or molecular layer deposition technique, and then treating the resulting film to introduce pores. The films are characterized in having extremely small thicknesses of pores that are typically well less than 50 nm in size.
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