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THIN FILM DEPOSITED INORGANIC METAL OXIDE AS A SELECTIVE SUBSTRATE FOR MAMMALIAN CELL CULTURE AND AS AN IMPLANT COATING
专利权人:
National University of Singapore;Agency for Science, Technology and Research
发明人:
Michal Marcin DYKAS,Kingshuk PODDAR,Xuefeng HU,Ee Jen Wilson WANG,Thirumalai Venky VENKATESAN,Abhijeet PATRA,Viknish KRISHNAN KUTTY,Paul Lorenz BIGLIARDI,Mei BIGLIARDI
申请号:
US16348838
公开号:
US20190345438A1
申请日:
2017.11.10
申请国别(地区):
US
年份:
2019
代理人:
摘要:
Disclosed herein is a material that may be useful as a coating for optical slides and medical implants. The material may aid or restrict grown of cells on a coating of the composite material. As such, there is provided a composite material having a substrate on the surface of which a coating layer of an amorphous metal oxide is formed. The metal oxide may be one or more of Ag2O, ZnO, ZrO2, TiO2, CuO, and Y2O3 and the coating layer may be from 5 to 100 nm thick and have a root mean square roughness of the coating surface is from 0.1 to 0.7 nm.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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