The present invention relates to a far infrared illumination device, comprising: an emission source of a concave spherical metal, the surface is plated with a high emissivity film which emits far infrared rays from the high emissivity film after heating； a funnel-shaped element has a hollow-shaped horn-like body, its one side corresponds to the emission source of the concave spherical metal and surrounding the surface plated with the high emissivity film, and a hollow - shaped wave guiding tube connected to another side of the horn-shaped body； and a heating assembly disposed and fixed to the other surface of the emission source of a concave spherical metal for providing thermal energy to the high emissivity film, wherein the far infrared rays generated by the high emissivity film emitting source are focused on a focus located in the funnel-shaped element to concentrate the far infrared ray intensity and are emitted through the wave guiding tube.本創作係有關一種遠紅外線照射裝置，包括：一凹球面狀金屬之發射源，表面鍍有一高放射率膜，於加熱後自該高放射率膜產生遠紅外線；一漏斗狀元件，具有一中空狀之喇叭狀本體，一側對應接於該凹球面金屬之發射源且環繞該鍍有高放射率膜之表面，及一中空狀之導波管，連接至該中空狀之喇叭狀本體之另一側；以及一加熱組件，設置並固接於該凹球面金屬之發射源之另一表面，用於提供熱能給該高放射率膜，其中，該具高放射率膜之發射源所產生之遠紅外線聚焦於一位於該漏斗狀元件內之焦點，以匯聚遠紅外線強度並經由該中空狀之導波管射出。
