有害物質処理装置
- 专利权人:
- 岩崎電気株式会社
- 发明人:
- 吉野 潔,岩崎 達行,木下 忍,田久保 剛,加藤 真示,渡邊 裕和,安藤 貴弘,白井 啓介
- 申请号：
- JP2005126993
- 公开号：
- JP4923435B2
- 申请日:
- 2005.04.25
- 申请国别(地区):
- JP
- 年份:
- 2012
- 代理人:
- 摘要：
PROBLEM TO BE SOLVED: To provide a harmful substance treatment device, capable of effectively treating gas including harmful substances such as VOC and odor at high concentration.
SOLUTION: This harmful substance treatment device 1 for treating harmful substances included in target gas is provided with a photocatalyst unit 21 comprising a UV-ray lamp 210 and a photocatalyst filter 222 surrounding the UV-ray lamp 210, that is activated by UV-ray radiated from the UV-ray lamp 21, and having gas permeability. The photocatalyst unit 21 is disposed in such a way that the target gas passes it roughly perpendicularly to the longer axis of the UV-ray lamp 210.
COPYRIGHT: (C)2007,JPO&INPIT
- 来源网站：
- 中国工程科技知识中心
