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Antimony-free photocurable resin composition and three dimensional article
专利权人:
Richard N. Leyden;Ranjana C. Patel;John Wai Fong;Carole Chapelat;Laurence Messe
发明人:
John Wai Fong,Richard N. Leyden,Laurence Messe,Ranjana C. Patel,Carole Chapelat
申请号:
US12092490
公开号:
US08334025B2
申请日:
2006.10.26
申请国别(地区):
US
年份:
2012
代理人:
摘要:
The present invention provides a low viscosity photocurable composition including (i) a cationically curable component (ii) a free radically active component (iii) an antimony-free cationic photoinitiator (v) a free radical photoinitiator, and (vi) a toughening agent. The photocurable composition can be cured using rapid prototyping techniques to form three-dimensional articles which can be used in various aerospace and investment casting applications.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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