自己組織化単層パターン化基材の湿式エッチング方法、及び金属パターン化物品

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专利权人:

スリーエム イノベイティブ プロパティズ カンパニー

发明人:

ツー， リジュン,フレイ， マシュー， エイチ．,カン， ミュンチャン,トッキー， ジェフリー， エイチ．

申请号：

JP20120517584

公开号：

JP6128847(B2)

申请日:

2010.06.17

申请国别(地区):

日本

年份:

2017

代理人:

摘要：

Method of patterning a substrate are described including a method of providing a substrate comprising a metalized surface having a self-assembled monolayer patterned region and unpatterned region; and wet etching the metalized surface in a liquid etchant agitated with bubbling gas to remove metal from the unpatterned regions to form a metal pattern. Also described are metal patterned article including an article comprising a substrate and an etched microcontact printed metal pattern disposed on the substrate wherein the pattern has a thickness of at least 100 nanometers and a pattern feature uniformity of at least 50% for an area of at least 25 cm2.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/