FILMS ULTRAMINCES D'OXYDE MÉTALLIQUE ET D'OXYDE DE CARBONE-MÉTAL PRÉPARÉS PAR DÉPÔT DE COUCHES ATOMIQUES (ALD)

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专利权人:

THE REGENTS OF THE UNIVERSITY OF COLORADO; A BODYCORPORATE

发明人:

WEIMER, ALAN, W.,LIANG, XINHUA,LI, JIANHUA,FALCONER, JOHN, L.,YU, MIAO

申请号：

EP10778113

公开号：

EP2429813A4

申请日:

2010.05.11

申请国别(地区):

EP

年份:

2014

代理人:

摘要：

Ultra-thin porous films are deposited on a substrate in a process that includes laying down an organic polymer, inorganic material or inorganic-organic material via an atomic layer deposition or molecular layer deposition technique, and then treating the resulting film to introduce pores. The films are characterized in having extremely small thicknesses of pores that are typically well less than 50 nm in size.

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