METHOD FOR ELIMINATING MICROORGANISMS PRESENT IN AND / OR ON THE SURFACE OF A MATERIAL TO BE DECONTAMINATED

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专利权人:

INSTITUT NATIONAL SUPERIEUR DES SCIENCES AGRONOMIQUES DE L'ALIMENTATION ET DE L'ENVIRONNEMENT (AGROSUP DIJON);UNIVERSITE DE BOURGOGNE

发明人:

LAURENT BENEY,PHILIPPE CAYOT,CEDRIC GRANGETEAU,SEBASTIEN DUPONT

申请号：

FR1857008

公开号：

FR3084262A1

申请日:

2018.07.27

申请国别(地区):

FR

年份:

2020

代理人:

摘要：

The present invention concerns a method for eliminating microorganisms present in and/or at the surface of a material to be decontaminated comprising a step of irradiating said material to be decontaminated with radiation consisting of at least two light beams α1 and α2 directed onto said material, the two light beams α1 and α2 respectively having a wavelength λ1 and λ2 of between 380 and 420 nm.

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