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Measuring system for ophthalmic surgery
专利权人:
Markus Seesselberg
发明人:
Markus Seesselberg,Peter Reimer,Christoph Hauger,Christoph Kuebler
申请号:
US13049708
公开号:
US08459795B2
申请日:
2011.03.16
申请国别(地区):
US
年份:
2013
代理人:
摘要:
The invention relates to an optical measuring system comprising a wave front sensor for characterizing a shape of a wave front of measuring light and an imaging lens, wherein the imaging lens comprises a first optical assembly and a second optical assembly for imaging an object region in an entrance region of the wave front sensor. A distance between the object region and the first optical assembly is larger than a focal length of the first optical assembly. Furthermore, the optical measuring system can comprise an optical microscopy system and optionally an OCT system for carrying out different optical examination methods at the same time.
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