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COMPOSITION FOR FORMING A FILM
专利权人:
SHIN-ETSU CHEMICAL CO.; LTD
发明人:
Tatsuya YAMASHITA,Takuya YOKOSAWA,Naosuke MARUYAMA,Mitsuo NARITA
申请号:
US15376921
公开号:
US20170173160A1
申请日:
2016.12.13
申请国别(地区):
US
年份:
2017
代理人:
摘要:
Provided is a composition for forming a film, the composition not having completely dissolved hydroxypropyl methyl cellulose (HPMC), and enabling formation of the film having a uniform thickness by suppressing the viscosity increase of the composition around an immersion temperature of 50° C. More specifically provided is a composition for forming a film, the composition comprising hypromellose having methoxy group content of 28.0 to 30.0% by weight and hydroxypropoxy group content of 7.6 to 8.5% by weight, wherein a 2% by weight aqueous solution of the hypromellose provides a viscosity at 20° C. of 4.0 to 6.5 mPa·s, a 20% by weight dispersion of the hypromellose provides a viscosity at 50° C. of 2,000 to 11,000 mPa·s, and a 20% by weight aqueous solution of the hypromellose provides a gelation temperature of 54 to 57° C.; and a solvent.
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