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酸化物半導体膜及びその製造方法
专利权人:
富士フイルム株式会社
发明人:
高田 真宏,田中 淳,鈴木 真之
申请号:
JP20140014679
公开号:
JP6117124(B2)
申请日:
2014.01.29
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
Provided is a metal oxide film, including a component having a peak position, in an XPS spectrum thereof, within a range corresponding to a binding energy of from 402 eV to 405 eV, the metal oxide film satisfying a relationship represented by Equation (1): A/(A+B)≧0.39, when an intensity of peak energy attributed to nitrogen 1s electron is obtained by peak separation, and a manufacturing method of the same, an oxide semiconductor film, a thin-film transistor, a display apparatus, an image sensor, and an X-ray sensor. In Equation (1), A represents a peak area of the component having a peak position within a range corresponding to a binding energy of from 402 eV to 405 eV, and B represents a peak area of a component having a peak position within a range corresponding to a binding energy of from 406 eV to 408 eV.
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中国工程科技知识中心
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