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Plasma treatment system
专利权人:
发明人:
Manabu Ishikawa,Shuichi Kimura,Koichiro Watanabe
申请号:
US15187477
公开号:
US09827032B2
申请日:
2016.06.20
申请国别(地区):
US
年份:
2017
代理人:
摘要:
A plasma treatment system includes a spout, a suction hole, a first electrode and a second electrode, an impedance acquisition unit, a liquid volume adjustment unit, and a first control unit. The first electrode and a second electrode are configured to generate plasma to treat a living tissue by the application of a voltage. The impedance acquisition unit acquires impedance between the first electrode and the second electrode. The liquid volume adjustment unit adjusts the supply volume or suction volume of the electrically conductive solution. The first control unit controls the liquid volume adjustment unit to increase or decrease the supply volume or suction volume of the electrically conductive solution based on the impedance.
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