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LIGHT IRRADIATION APPARATUS
专利权人:
SEOUL VIOSYS CO.; LTD.
发明人:
Yeong Min YOON,A Young LEE,Hee Ho BAE,Joon-Pio HONG
申请号:
US16539620
公开号:
US20200054893A1
申请日:
2019.08.13
申请国别(地区):
US
年份:
2020
代理人:
摘要:
A light irradiation apparatus includes first and second light sources that emit first light and second light, respectively. The first and the second lights have mutually different wavelengths at timings close to each other, regardless of overlap between the first light and the second light. The first light has a wavelength band for inducing destruction of bacteria by damaging a cell of the bacteria as the first light acts on a photosensitizer present in the bacteria. The second light has a wavelength band for inducing the destruction of the bacteria by changing the structure of a genetic material present in the cell of the bacteria. A dose of the second light source is less than 1/10 of a dose of the first light source.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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