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APPAREIL DE SURVEILLANCE DE POSITION DE FAISCEAU ET SYSTÈME D'IRRADIATION À FAISCEAU DE PARTICULES CHARGÉES
专利权人:
Hitachi; Ltd.
发明人:
申请号:
EP15156580.1
公开号:
EP2910279A1
申请日:
2015.02.25
申请国别(地区):
EP
年份:
2015
代理人:
摘要:
A scanning magnet (28, 29) of an irradiation nozzle (27) is controlled to irradiate the ion beam irradiated from a synchrotron accelerator to a target position Pi,j of a spoti,j in a certain layer Li of a target volume, using a scanning control apparatus (40). A deviation Dj between the target position Pi,j and an actual irradiation position Pai,j is obtained. Using the deviation Dj, a systematic error Esi,j and a random error Eri,j of the actual irradiation position Pai,j are obtained. Whether the systematic error Esi,j exists within a first permissible range of the systematic error Esi,j is determined. Whether the random error Eri,j exists within a second permissible range of the random error Eri,j is determined. When the systematic error Esi,j or the random error Eri,j is deviated from the permissible range, the irradiation of the ion beam to the target volume is stopped.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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