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METHOD FOR PRODUCING ORIGINAL PLATE, METHOD FOR PRODUCING MICRONEEDLE PATCH, MICRONEEDLE PATCH, AND EXPOSURE APPARATUS
专利权人:
TOPPAN PRINTING CO.; LTD.
发明人:
TOMONO, TAKAO
申请号:
EP07792659
公开号:
EP2060950A4
申请日:
2007.08.17
申请国别(地区):
EP
年份:
2014
代理人:
摘要:
A method of manufacturing a master plate includes the steps of forming a photoresist film on a substrate, disposing a photomask having a plurality of island radiation shields on the photoresist film followed by integrating the photomask and the photoresist film, applying light from a light source to the photoresist film through the photomask for selectively exposing the photoresist film, and developing the photoresist film to form a master plate, in which the method includes irradiating the photoresist film with the light from plural directions through the photomask to selectively expose the photoresist film from the respective directions.
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