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Microneedle patch manufacturing method
专利权人:
凸版印刷株式会社
发明人:
友野 孝夫
申请号:
JP2006223600
公开号:
JP5070764B2
申请日:
2006.08.18
申请国别(地区):
JP
年份:
2012
代理人:
摘要:
<;P>;PROBLEM TO BE SOLVED: To provide a method of manufacturing a microneedle patch having sharp tips and good surface smoothness with a relatively simple process, and to provide a microneedle having low surface roughness obtained by the method. <;P>;SOLUTION: The method for manufacturing an original includes: a photosensitive member forming step of providing a photomask having a plurality of island-like light shielding portions for partially shielding light on a photoresist layer to form a photosensitive member; an exposure step of selecting and controlling the exposure portion of the photoresist through the photomask by irradiating the photosensitive member with light from above the member; and a photoresist processing step of removing the photomask from the photosensitive member and developing the resist; wherein the exposure step includes an orientation adjusting irradiation step of subjecting the photosensitive member to multiple irradiation in different irradiation directions. <;P>;COPYRIGHT: (C)2008,JPO&INPIT
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/
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