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抗菌・消臭組成物およびこれを用いた抗菌・消臭方法
专利权人:
ライオン株式会社
发明人:
鈴木 右子,藤村 昌平,山岸 弘,泉川 洋亮,河野 博信
申请号:
JP2007052911
公开号:
JP5101135B2
申请日:
2007.03.02
申请国别(地区):
JP
年份:
2012
代理人:
摘要:
An antimicrobial and deodorant composition and an antimicrobial deodorization method using the same are provided to suppress the activity of microorganisms generating the offensive odor by components containing antimicrobial inorganic metal and the composition containing specific polymer. An antimicrobial and deodorant composition consists of components(A) containing antimicrobial inorganic metal, nitrogen containing polymer(B), and polymer water-soluble glucan or sugar-alcohol(C) having alpha-1,4-glucoside linkage. The nitrogen containing polymer contains basic poly amino acid. The component contains at least one kind of antimicrobial inorganic metal selected from silver, copper, and zinc. The antimicrobial and deodorant composition is sprayed in the maximum particle diameter less than 300 micrometers. The polymer water-soluble glucan or sugar-alcohol continuously deodorizes heavy chain aldehydes and remains on the surface of cloth products.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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