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X線撮像装置、及び、これに用いるX線源
专利权人:
国立大学法人;東京大学
发明人:
百生 敦
申请号:
JP2008038181
公开号:
JP5158699B2
申请日:
2008.02.20
申请国别(地区):
JP
年份:
2013
代理人:
摘要:
Provided are an X-ray source enabling the omission of installation of multi-slits in a highly sensitive X-ray imaging method using an X-ray Talbot-Lau interferometer and an X-ray imaging apparatus using the X-ray source. An X-ray source (10) comprises a substrate (11) and plural stripe portions (12). The plural stripe portions (12) are disposed on the surface of the substrate (11). The plural stripe portions (12) are disposed at intervals. The disposition interval ds between the plural stripe portions is nearly constant. Either the substrate (11) or the stripe portion (12) is made of metal that generates the required amount of X-rays by excitation beam irradiation.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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