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POINT SIZE LIGHT ILLUMINATION IN METROLOGY SYSTEMS FOR IN-SITU SURGICAL APPLICATIONS
专利权人:
Covidien LP
发明人:
Alexey Sharonov
申请号:
US13645559
公开号:
US20130110005A1
申请日:
2012.10.05
申请国别(地区):
US
年份:
2013
代理人:
摘要:
A metrology method includes the steps of positioning a point source projector at a known distance from a target site, projecting a light beam through a semi-transparent mask, forming a magnified pattern on the target site from the light beam, visually inspecting a portion of the magnified pattern that is formed on the target site, and determining a measurement of the target site based on the known dimensions of the mask pattern, a magnification factor, and the portion of the magnified pattern that is formed on the target site. The light beam diverges from a point and the semi-transparent mask has a mask pattern of known dimensions. The magnified pattern is magnified from the mask pattern by the magnification factor.
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