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PHOTOPROTECTIVE COMPOUNDS, COMPOSITIONS INCLUDING SAME AND USES THEREOF
专利权人:
发明人:
Nicolas GOUAULT,Khanh Hung NGUYEN,Sophie TOMASI,Karine COSTUAS
申请号:
US14782925
公开号:
US20160067162A1
申请日:
2014.04.04
申请国别(地区):
US
年份:
2016
代理人:
摘要:
A compound of formula (I):wherein:R1 is H, benzyl, —CH2—O-benzyl, a straight or branched C1-C12 alkyl radical, a hydroxyalkyl radical or a polyhydroxyalkyl radical,R2 is H a straight or branched C1-C12 alkyl radical a —(CH2)3—CH═CH2 radical a phenyl, naphthyl, furan, thiophene or pyrazole radical, optionally substituted by at least one group selected among methoxy, phenoxy, halogen, dimethylamine, trifluoromethyl and alkynyl,R3 is H a vinyl radical optionally substituted by a carboxyalkyl a nitrile a carboxamide a phenyl, naphthyl, furan, thiophene or pyrazole radical, optionally substituted by at least one group selected among methoxy, phenoxy, halogen, dimethylamine, trifluoromethyl and alkynyl an aminoalkyl or aminocarboxyl radical or an alkoxy radical,R4 is H, a protective grouping, a straight or branched C1-C12 alkyl radical, a hydroxyalkyl radical or a polyhydroxyalkyl radical,and when:R2 is H, R3 is —NHCOOC(CH3)3,R2 is a propyl, R3 is —CH═CH—COO—C2H5 or R1=R3=R4=H,R2 is a non-substituted phenyl, R3 is —CH═CH—COO—C2H5 or —NHCOOC(CH3)3,R2 is a phenyl substituted in the para position, R3 is H.
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