PROBLEM TO BE SOLVED: To reduce the influence of an obstacle on a measuring beam.SOLUTION: A fundus device includes scanning means for scanning of a measuring beam to irradiate the fundus of a subject eye, and incident position change means that changes an incident position of the measuring beam subjected to scanning by the scanning means upon the subject eye so as to avoid an obstacle that prevents the incidence of the measuring beam upon the subject eye.COPYRIGHT: (C)2014,JPO&INPIT【課題】 障害物の測定光に対する影響を低減する。【解決手段】 被検眼の眼底を照射する測定光を走査する走査手段と、被検眼への前記測定光の入射を妨げる障害物を避けるように、前記走査手段で走査された測定光の被検眼への入射位置を変更する入射位置変更手段と、をそなえる。【選択図】 図1
