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UNSATURATED QUATERNARY AMMONIUM SALT
专利权人:
KJケミカルズ株式会社;KJ CHEMICALS CORP
发明人:
KUDO MAYU,工藤 繭,HIRATA AKIMICHI,平田 明理
申请号:
JP2014066417
公开号:
JP2015189680A
申请日:
2014.03.27
申请国别(地区):
JP
年份:
2015
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide an unsaturated quaternary ammonium salt with high purity including no halogen in the molecule, high in safety, harmless in the environment, including no moisture, also excellent in dissolubility to water, organic solvents, conventional vinyl monomers and resins, and suitably usable even to various electrochemical devices, to provide an efficient and economical production method for the unsaturated quaternary ammonium salt, and to provide a composition using the unsaturated quaternary ammonium salt as a constituting component.SOLUTION: Provided is an unsaturated quaternary ammonium salt represented by general formula (1). Also provided is a method for producing an unsaturated quaternary ammonium salt including a process where a cyclic ether group-containing compound and a tertiary amine compound are reacted without using water and/or a protonic organic solvent as a reaction solvent. Also provided is a composition comprising the unsaturated quaternary ammonium salt.【課題】ハロゲンを分子内に含まず、安全性が高く、環境に無害で、水分を含まない、且つ、水や有機溶媒、通用のビニルモノマー、樹脂への溶解性に優れ、各種電気化学デバイスにも好適に用いられる、高純度の不飽和第四級アンモニウム塩、及び該不飽和第四級アンモニウム塩の効率的、且つ経済的な製造方法を提供する。また、該不飽和第四級アンモニウム塩化合物を構成成分とする組成物の提供。【解決手段】一般式(1)で表される飽和第四級アンモニウム塩。反応溶媒として、水及び/またはプロトン性有機溶媒を用いず、環状エーテル基含有化合物と三級アミン化合物を反応させる工程を含む不飽和第四級アンモニウム塩の製造方法、及び該不飽和第四級アンモニウム塩を含有する組成物。【選択図】なし
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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