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Charged particle beam apparatus and control method thereof
专利权人:
HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人:
Takeshi Sunaoshi,Yoshihisa Orai,Haruhiko Hatano,Takashi Mizuo
申请号:
US15777121
公开号:
US10784074B2
申请日:
2016.11.29
申请国别(地区):
US
年份:
2020
代理人:
摘要:
The invention is directed to a charged particle beam apparatus that enables temperature maintenance in a cooling unit provided inside a vacuum application apparatus using a refrigerant. The charged particle beam apparatus includes a cooling tank that contains a refrigerant for cooling a cooling unit, a cooling pipe that supplies the refrigerant from the cooling tank to the cooling unit, and a unit that leads the refrigerant to liquefy when the refrigerant is biased to a solid.
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