The present invention provides a gel polish composition characterized by containing no irritating reactive (meth)acrylate monomer, such as hydroxyethylmethacrylate (HEMA) and ethyl methacrylate (EMA). In the present invention, the gel polish composition comprises at least an aliphatic urethane acrylate oligomer, a polyester acrylate oligomer, a low-irritating acrylate monomer, and a photoinitiator. The gel polish composition possesses low or no irritating effects to skin, exhibits excellent adhesiveness to nails, and is stable in long-term storage at ordinary shelf conditions.
