Anthony E. Winston,Richard F. Stockel,Anthony J. Sawyer
申请号：
US16335597
公开号：
US20200022363A1
申请日:
2017.09.21
申请国别(地区):
US
年份:
2020
代理人:
摘要：
Process for forming controlled release antimicrobial salts that include a four-part mixture of (i) an antimicrobial cation, (ii) the anion of an organic acid, (iii) an ammonium, sodium or potassium cation and (iv) an anion such as a halide, acetate or gluconate, dissolved in a solvent so that a concentrate with dissociated controlled release antimicrobial ions is formed. Upon addition of water, controlled-release antimicrobial salt having a solubility in water at 20° C. of greater than about 0.001 (w/w) %, but less than about 1 (w/w) % are formed. Alternatively, a controlled release antimicrobial salt is formed in situ at a site of application containing moisture by addition of a concentrate having dissociated controlled release antimicrobial ions.
