Yann Astier,David Esteban,Judson R. Holt,Henry K. Utomo
申请号：
US16733520
公开号：
US20200141845A1
申请日:
2020.01.03
申请国别(地区):
US
年份:
2020
代理人:
摘要：
A device for isolating a microbe or a virion includes a semiconductor substrate； and a trench formed in the semiconductor substrate and extending from a surface of the semiconductor substrate to a region within the semiconductor substrate； wherein the trench has dimensions such that the microbe or the virion is trapped within the trench.
