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BIOCOMPATIBLE THIN FILM MATERIALS FOR COVERING METAL DENTAL IMPLANTS
专利权人:
INSTITUTUL NAŢIONAL DE CERCETARE-DEZVOLTARE PENTRU OPTOELECTRONICĂ - INOE 2000
发明人:
BRAIC MARIANA,BRAIC MARIANA,KISS ADRIAN EMIL,KISS ADRIAN EMIL,BRAIC VIOREL,BRAIC VIOREL,VLĂDESCU ALINA,VLĂDESCU ALINA
申请号:
RO201000915
公开号:
RO127411B1
申请日:
2010.09.29
申请国别(地区):
RO
年份:
2016
代理人:
摘要:
The invention relates to materials made up of biocompatible thin layers with compositional gradient used for coating the metal alloys employed in making dental implants and biomedical devices in stomatology. According to the invention, the materials are made of successive thin layers as follows : the first layer comprises metal Ti with a thickness ranging between 50...200 nm, the second layer comprises stoichiometric nitrides such as TiN or ZrN with a thickness ranging between 0.5...2 &mum, the third layer comprises stoichiometric oxynitrides such as TiON or ZrON with compositional gradient and with a thickness ranging between 0.5...2 &mum, wherein the ratio O/(O+N) continuously varies between 0...1 starting from the lower nitride layer, and the last layer comprises stoichiometric oxides such as TiOor ZrOwith a thickness ranging between 1...4 &mum, the total thickness of the layers varying between 2...8 &mum, the critical normal forces in the scratch adhesion testing being higher than 22 N, with microhardness higher than 18 GPa, the amount of ions released in the Carter-Brugirard artificial saliva being lower than 35 &mug/cmand with a cellular viability factor higher than 85% upon citotoxicity assay.Invenţia se referă la materiale realizate din straturi subţiri biocompatibile, cu gradient compoziţional, folosite pentru acoperirea aliajelor metalice din care sunt realizate implanturile dentare şi dispozitivele biomedicale din stomatologie. Materialele conform invenţiei sunt realizate din straturi subţiri succesive, astfel: primul strat este format din Ti metalic cu grosimea cuprinsă între 50 şi 200 nm, al doilea strat este format din nitruri stoichiometrice de TiN sau ZrN cu grosimea cuprinsă între 0,5 şi 2 μm, al treilea strat este format din oxinitruri stoichiometrice de TiON sau ZrON, cu gradient compoziţional şi cu grosimea cuprinsă între 0,5...2 μm, în care raportul O/(O + N) variază continuu între 0 şi 1, începând cu stratul inferior de nitrură, iar ultimul
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中国工程科技知识中心
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