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СПОСОБ И УСТРОЙСТВО ДЛЯ ОПРЕДЕЛЕНИЯ ОПТИЧЕСКИХ АБЕРРАЦИЙ ГЛАЗА
专利权人:
УЭЙВЛАЙТ ГМБХ (DE)
发明人:
ВЮЛЛЬНЕР Кристиан (DE),ДОНИЦКИ Кристоф (DE),КЕММЕРЕР Майк (DE)
申请号:
RU2014143460
公开号:
RU2014143460A
申请日:
2012.07.10
申请国别(地区):
RU
年份:
2016
代理人:
摘要:
1. A method of determining optical aberrations of the eye (12) comprising: measuring the length of said eye (12) to obtain the measured axial length (198, OL) eyes, determining, by the aberrometer, aberration (100) of the wave front of the eye (12) wave like deviation front (102) formed by the optical system (30) of the eye (12), the wave front (104) generated by an aberration-free eye model, using as a model the axial eye length measured axial length (198, OL) glaza.2. . A method according to claim 1, wherein the step of determining comprises: configuration projecting (26) a plurality of constituent beams (22) through an optical system (30) of the eye (12) to receive on the retina (40) of the eye first pattern (116) points, receiving a second pattern (118) points in a plurality of second projections (119) obtained by projecting the first pattern (116) points on the second surface (54), and comparing the second projections (119) with a plurality of projections models generated by model glaza.3 aberration-free. A method according to claim 1, comprising the steps of: (a) formation of a parallel beam (16) of light beams constituting a plurality of individual beams (22 22-1 ... 22-5), forming a two-dimensional configuration (26) (b) projection. configuration (26) constituting the beams (22) through an optical system (30) of the eye (12) to receive the first projection (117) constituting the beams (22 22-1 ... 22-5) a first pattern (116) of points on the retina (40) of the eye (c) ophthalmoscopic projecting the first pattern (116) points on the second plane (54) located outside the eye (12) to receive from Mo oryh projections (119) of the first projection (117) of the second pattern (118) dots (d) recording the second pattern (118) points on the second plane (54) (f) measuring, for each second projection (119), offset (124 ) ophthalmoscopic projection (119) constituting the beam in the second pattern (118)1. Способ определения оптических аберраций глаза (12), включающий:
来源网站:
中国工程科技知识中心
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