您的位置: 首页 > 农业专利 > 详情页

Optical metrology with reduced focus error sensitivity
专利权人:
KLA-Tencor Corporation
发明人:
Krishnan Shankar,Zhuang Guorong V.,Wang David Y.,Liu Xuefeng
申请号:
US201514833370
公开号:
US9970863(B2)
申请日:
2015.08.24
申请国别(地区):
美国
年份:
2018
代理人:
Spano Law Group `Spano Joseph S.
摘要:
Methods and systems for performing broadband spectroscopic metrology with reduced sensitivity to focus errors are presented herein. Significant reductions in sensitivity to focus position error are achieved by imaging the measurement spot onto the detector such that the direction aligned with the plane of incidence on the wafer surface is oriented perpendicular to the direction of wavelength dispersion on the detector surface. This reduction in focus error sensitivity enables reduced focus accuracy and repeatability requirements, faster focus times, and reduced sensitivity to wavelength errors without compromising measurement accuracy. In a further aspect, the dimension of illumination field projected on the wafer plane in the direction perpendicular to the plane of incidence is adjusted to optimize the resulting measurement accuracy and speed based on the nature of target under measurement.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

意 见 箱

匿名:登录

个人用户登录

找回密码

第三方账号登录

忘记密码

个人用户注册

必须为有效邮箱
6~16位数字与字母组合
6~16位数字与字母组合
请输入正确的手机号码

信息补充