Andrea E. Schlather,Aline Aude Guimont,Daniella Cristina Gonzalez-Toro
申请号：
US16176130
公开号：
US20200129403A1
申请日:
2018.10.31
申请国别(地区):
US
年份:
2020
代理人:
摘要：
The invention relates to compositions for removing nail polish comprising a solvent and a high load of colorant, preferably between 0.5 wt % and 5.0 wt %. Preferably, the composition has an absorption peak in a range between 460 nm and 600 nm, and a normalized extinction of at least 0.5 for at least one wavelength in the range when measured in an optically transparent solvent via spectrophotometer and across 1 cm path length in a ratio of 1:8 composition to optically transparent solvent. Methods of removing nail polish are also provided.
