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気体溶解水製造装置及び気体溶解水製造方法
专利权人:
野村マイクロ・サイエンス株式会社
发明人:
佐久間 浩一,篠崎 宏行,上西 允彦
申请号:
JP20110278394
公开号:
JP6059871(B2)
申请日:
2011.12.20
申请国别(地区):
日本
年份:
2017
代理人:
摘要:
PROBLEM TO BE SOLVED: To provide a gas dissolved water producing apparatus in which gas solubility directly after the start of feed, and further, specific resistance value are stable even if an operation is intermittently performed.SOLUTION: The gas dissolved water producing apparatus 1 is provided with: a pure water feed pipe 3 of intermittently feeding pure water by a water feed valve 2; a gas dissolution part 4 connected with the pure water feed pipe 3 and inserted with a gas feed pipe 7; and a gas flow rate regulation apparatus 6 of regulating the feed amount of the gas; wherein the gas is injected into the pure water via the gas feed pipe 7 to produce gas dissolved water in which the gas is dissolved at a fixed concentration. The apparatus includes a controller 11 of stopping the injection of the gas upon the closing of the water feed valve 2, and making the setting of the feed amount of the gas to the setting in which the feed amount of the gas is larger than that in the ordinary case for a fixed time a
来源网站:
中国工程科技知识中心
来源网址:
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