DR SIDDHARTH YUVRAJ GOSAVI,DR SULEKHA SIDDHARTH GOSAVI,1 DR VISHAL MOHAN KALE
申请号：
IN590/MUM/2013
公开号：
IN2013MU00590A
申请日:
2013.02.28
申请国别(地区):
IN
年份:
2014
代理人:
摘要：
The MAXILLARY ‘M’ WAX SPACER FOR FINAL IMPRESSION MATERIAL IN COMPLETE DENTURE is a wax spacer on maxillary edentulous arch considering the resorption pattern and stress distribution in maxilla. In this, two different thickness of spacer are used and adapted in two steps. First layer of 0.2 mm spacer wax covering the whole maxillary arch and keeping 4 mm short of sulcus. Over that second layer of 1mm thick wax covering only the crest of ridge, the buccal and labial slopes of the ridge, incisive papilla and mid palatine raphe is adapted. This design will overcome the resorption pattern of the maxilla and distribute the stress only on stress bearing areas in the maxilla which will benefit to the overall prognosis of the arch and well-being of the patient.
