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RESIN COMPOSITION AND APPLICATIONS THEREOF
专利权人:
KURARAY CO.; LTD.
发明人:
Edgard CHOW,Kentaro YOSHIDA,Tatsuya HASEGAWA
申请号:
US16332586
公开号:
US20200291197A1
申请日:
2017.09.13
申请国别(地区):
US
年份:
2020
代理人:
摘要:
A resin composition contains an ethylene-vinyl alcohol copolymer (A) in which an ethylene unit content is from 10 to 60 mol %, a hindered amine-based compound (B) having a 2,2,6,6-tetraalkylpiperidine ring structure and having an alkoxy group bonded to a nitrogen atom in the structure, and a hindered phenol-based compound (C) having an ester bond or an amide bond. The resin composition contains 0.1 to 5 parts by mass of the hindered amine-based compound (B) and 0.2 to 5 parts by mass of the hindered phenol-based compound (C) with respect to 100 parts by mass of the ethylene-vinyl alcohol copolymer (A), and a mass ratio (C)/(B) is from 0.2 to 3.6.
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