ANTIMICROBIAL COMPOSITIONS AND METHODS OF THEIR USE

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专利权人:

发明人:

DAUTREUIL FRANCIS,SHAPIRA RON,MECCIA JOHN,HYATT SETH

申请号：

IN201717010549

公开号：

IN201717010549A

申请日:

2017.03.24

申请国别(地区):

IN

年份:

2017

代理人:

摘要：

The present disclosure is directed to antimicrobial compositions comprising a hypochlorite salt a copper (II) salt and an optionally acid that is an inorganic acid an organic acid or a combination thereof and optionally a buffering agent and having a chlorine concentration of between 0.1 ppm and 300 ppm and a copper (II) concentration of between 0.1 ppm and 300 ppm. Methods of making and using these compositions is also described.

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