Robert Liska,Christian Gorsche,Markus Kury,Yan Chen,Chunhua Li,Srinivas Kaza
申请号：
US16403435
公开号：
US10781274B2
申请日:
2019.05.03
申请国别(地区):
US
年份:
2020
代理人:
摘要：
Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.
