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PHOTO-CURABLE RESIN COMPOSITIONS AND ARTICLE USING THE SAME
专利权人:
SUNG WON;PARK
发明人:
PARK, SUNG WON,박성원
申请号:
KR1020170184766
公开号:
KR1019314540000B1
申请日:
2017.12.29
申请国别(地区):
KR
年份:
2018
代理人:
摘要:
The present invention relates to a photo-curable composition and to dental molded articles produced using the same, wherein the photo-curable composition contains a urethane (meth) acrylate oligomer, a (meth) acrylate modified siloxane resin, a di (meth) acrylate reactive monomer, a polycarboxylic acid and a photopolymerization initiator. It is an object of the present invention to provide the dental photocurable composition having a low viscosity and a high curing speed and can exhibit excellent aesthetic impression and mechanical properties.본 발명은 광경화성 조성물 및 이를 이용하여 제조된 치과용 성형품에 대한 것으로, 상기 광경화성 조성물은 우레탄 (메타)아크릴레이트 올리고머, (메타)아크릴레이트 변성 실록산 수지, 디(메타)아크릴레이트계 반응성 모노머, 폴리카르보실록산 및 광중합 개시제를 포함한다.
来源网站:
中国工程科技知识中心
来源网址:
http://www.ckcest.cn/home/

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