Rohm and Haas Electronic Materials LLC;Rohm And Haas Electronic Materials Korea Ltd.
发明人:
IMANARI, Masaaki,LEE, Yil-Hak
申请号：
EP20170197736
公开号：
EP3312308(A1)
申请日:
2017.10.23
申请国别(地区):
欧洲专利局
年份:
2018
代理人:
摘要：
The present invention relates to a boric-acid free nickel plating composition which does not include organic carboxylic acid but has high bath-pH-stability. The nickel plating composition provides a nickel plating film suitable for the use of electronic components.
