Antimicrobial photo-stable coating composition

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专利权人:

Covalon Technologies Ltd.

发明人:

Vyacheslav, Dudnik,Ditizio, Valerio,Dicosmo, Frank,Yakeemovich, Natali

申请号：

AU2008281278

公开号：

AU2008281278B2

申请日:

2008.07.31

申请国别(地区):

AU

年份:

2012

代理人:

摘要：

The invention is an antimicrobial photo-stable coating composition that deters photo-induced discoloration, does not stain tissue and can be applied to the surface of a variety of medical materials. The composition comprises in an aspect silver-PCA complex and dye.

来源网站：

中国工程科技知识中心

来源网址：

http://www.ckcest.cn/home/