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CLEANSING COMPOSITION
专利权人:
发明人:
Izumi Katsuta,Kouji Endou,Mayuko Hirahara,Satoshi Ozawa,Eiko Nishisaka,Tetsuji Kitou
申请号:
US14917513
公开号:
US20160213594A1
申请日:
2014.07.11
申请国别(地区):
US
年份:
2016
代理人:
摘要:
Cleansing composition comprising the following components (A), (B), and (C):(A) 0.02% by mass or larger and 10% by mass or smaller of a polymer comprising 85 to 100% by mass as constitutional units ofa1: a constitutional unit represented by the formula (1):wherein R1 and R2 each represents an alkyl group having 1 to 4 carbon atoms and optionally having a hydroxy group, or a hydrogen atom, and R3 represents a hydrogen atom or a methyl group, anda2: a constitutional unit represented by the formula (2):wherein R4 represents a linear or branched alkyl group having 1 to 22 carbon atoms, and R5 represents a hydrogen atom or a methyl group(B) 0.5% by mass or larger and 40% by mass or smaller of an anionic surfactant and(C) water.
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