ACTIVATION CHAMBER AND KIT USED IN TREATMENT DEVICE FOR LOWERING ELECTRON AFFINITY, TREATMENT DEVICE THAT CONTAINS SAID KIT AND IS USED TO LOWER ELECTRONIC AFFINITY, PHOTOCATHODE ELECTRON-BEAM SOURCE, ELECTRON GUN CONTAINING PHOTOCATHODE ELECTRON-BEAM SOURCE, FREE-ELECTRON LASER ACCELERATOR, TRANSMISSION ELECTRON MICROSCOPE, SCANNING ELECTRON MICROSCOPE, ELECTRON-BEAM HOLOGRAPHY MICROSCOPE, ELECTRON-BEAM LITHOGRAPHY DEVICE, ELECTRON-BEAM DIFFRACTION DEVICE, AND ELECTRON-BEAM SCANNING DEVICE
This invention provides a treatment device for lowering electron affinity, said treatment device being capable of performing an EA surface treatment on a photocathode material or an EA surface retreatment on a photocathode, and an electron-beam device provided with said treatment device. An activation chamber (20) used in a treatment device for lowering electron affinity by vaporizing a surface-treatment material (30) and using the vaporized surface-treatment material (30) to perform an electron-affinity lowering treatment on a photocathode material (52) or an electron-affinity lowering retreatment on a photocathode (52), said activation chamber (20) being characterized by containing holes through which electrons can pass.
