PROCESS FOR PROVIDING A TOPOGRAPHY TO THE SURFACE OF A DENTAL IMPLANT

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专利权人:

Frank Homann;Phillippe Habersetzer

发明人:

Frank Homann,Phillippe Habersetzer

申请号：

US13751839

公开号：

US20130177876A1

申请日:

2013.01.28

申请国别(地区):

US

年份:

2013

代理人:

摘要：

A process for providing a topography to the surface of a dental implant, said surface being made of a ceramic material. At least a part of the surface of the dental implant is etched with an etching solution comprising hydrofluoric acid at a temperature of at least 70° C. Thereby, discrete grains or agglomerates of grains are removed from the ceramic material.

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中国工程科技知识中心

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http://www.ckcest.cn/home/